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Yale's T.p. Ma Proposes Unipolar Cmos

机译:耶鲁的TP马提出单极性Cmos

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Yale University Professor T.P. Ma has proposed an all-n-channel CMOS that could be faster and simpler to fabricate than today's CMOS, which relies on both electrons and holes as carriers. Ma calls his proposal Unipolar CMOS, and he described it for the first time at the Sematech-organized International Symposium on Advanced Gate Stack Technology in October. The device is a dual-channel structure that would use electrons in both the front and back channels, taking advantage of the higher mobility of electrons compared with holes. For III-V channels such as GalnAs and InAs, the disparity between hole and electron mobility is more than an order of magnitude. At room temperature, holes in silicon have a mobility of 450 cm~2/Vs, while electron mobility is 1500 cm~2/Vs.
机译:耶鲁大学教授Ma提出了一种全n通道CMOS,它比依靠电子和空穴作为载流子的当今CMOS更快,更简单。马云称他的提议为“单极CMOS”,他在10月由Sematech组织的有关高级栅极堆叠技术的国际研讨会上首次进行了描述。该器件是双通道结构,在电子的前,后通道中都将使用电子,这是因为电子比空穴具有更高的迁移率。对于诸如GalnAs和InAs之类的III-V通道,空穴和电子迁移率之间的差异大于一个数量级。在室温下,硅中的空穴的迁移率为450 cm〜2 / Vs,而电子迁移率为1500 cm〜2 / Vs。

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