CHEMICAL VAPOR DEPOSITION OF Mo,Re,AND Ta FILMS

摘要

The conditions for depositing single-phase Ta and Re films were determined by thermodynamic analysis of the vapor-phase reduction of TaBr_5 and ReCl_5 with cadmium at 10~5 Pa. Tantalum deposition in the TaBr_5-Cd system is possible at lower temperatures (750-800 K for Br:Cd>2:1 ) than that in the TaCl_5-Cd system (T>1050 K). Dense molybdenum, tantalum, and rhenium coatings (including multilayers) on molybdenum and copper substrates were obtained by reducing MoCl_5,TaBr_5,and ReCl_5 with cadmium.