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首页> 外文期刊>Journal of the Korean Physical Society >Influence of Al-, Co-, Cu-, and In-doped ZnO Buffer Layers on the Structural and the Optical Properties of ZnO Thin Films
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Influence of Al-, Co-, Cu-, and In-doped ZnO Buffer Layers on the Structural and the Optical Properties of ZnO Thin Films

机译:Al,Co,Cu和In掺杂的ZnO缓冲层对ZnO薄膜的结构和光学性能的影响

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摘要

Zinc oxide (ZnO) thin films without a buffer layer and with Al-, Co-, Cu-, and In-doped ZnO buffer layers were prepared by using the sol-gel spin-coating method. For the first time, the effects of the ZnO buffer layers doped with different metal materials on the structural and the optical properties of the ZnO thin films are investigated. The surface morphologies of the ZnO thin films having wrinkle structures significantly depended on the type of buffer layer. The largest crystallite size and the highest c-axis orientation were observed for the ZnO thin film with a Co-doped ZnO buffer layer. However, the transmittance for the ZnO thin films with metal-doped buffer layers was slightly decreased compared to that without the buffer layer, and metal-doped ZnO buffer layers hardly affected the optical band gap of the ZnO thin films.
机译:通过使用溶胶-凝胶旋涂法制备了没有缓冲层以及具有Al,Co,Cu和In掺杂的ZnO缓冲层的氧化锌(ZnO)薄膜。首次研究了掺杂不同金属材料的ZnO缓冲层对ZnO薄膜的结构和光学性能的影响。具有皱纹结构的ZnO薄膜的表面形态在很大程度上取决于缓冲层的类型。对于具有Co掺杂的ZnO缓冲层的ZnO薄膜,观察到最大的微晶尺寸和最高的c轴取向。但是,与不具有缓冲层的情况相比,具有金属掺杂的缓冲层的ZnO薄膜的透射率稍微降低,并且金属掺杂的ZnO缓冲层几乎不影响ZnO薄膜的光学带隙。

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