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The effect of annealing graphene in O_2 and N2 flow

机译:退火石墨烯在O_2和N2流动的影响

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Thermal annealing is potentially capable of removing surface contaminants of polymers on graphene while annealing parameters are crucial to prevent graphene from unintended damages. We studied the influence of O_2 flow and N2 flow during an anneal treatment on few-layer graphene through transmittance and Raman spectroscopy. Annealing in O_2 atmosphere at 400 °C was observed to provide graphene with being etched and damaged. On the other hand, by annealing in N2, a noticeable change in the defect state was hardly observed while amorphous carbon was found on the surface, which is expected to be due to the decomposition of polymer residues at the graphene surface.
机译:热退火可能能够在石墨烯上除去聚合物的表面污染物,同时退火参数是至关重要的,以防止石墨烯意外损害。 通过透射率和拉曼光谱研究在几层石墨烯的退火处理过程中研究了O_2流动和N2流动的影响。 观察到400°C的O_2气氛中的退火,以提供具有蚀刻和损坏的石墨烯。 另一方面,通过在N 2中退火,几乎没有观察到缺陷状态的明显变化,而在表面上发现无定形碳,这预计是由于石墨烯表面上的聚合物残基的分解。

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