首页> 外文OA文献 >The effect of annealing temperature and time on synthesis of graphene thin films by rapid thermal annealing
【2h】

The effect of annealing temperature and time on synthesis of graphene thin films by rapid thermal annealing

机译:退火温度和时间对快速热退火合成石墨烯薄膜的影响

摘要

In this paper, we performed synthesis of graphene thin films by rapid thermal annealing (RTA) of thin nickel–copper (Ni/Cu) layers deposited on spectroscopic graphite as a carbon source. Furthermore, we investigated the effect of annealing temperature and annealing time on formation and quality of synthesized graphene films. Raman spectroscopy study showed that annealing at lower temperatures results in formation of monolayer graphene films, while annealing at higher temperatures results in formation of multilayer graphene films. We used Raman mapping to determine the distribution of graphene sheets. Surface morphology of graphene thin films was investigated by atomic force microscopy and scanning electron microscopy with EDS probe.
机译:在本文中,我们通过在光谱石墨上作为碳源沉积的镍-铜(Ni / Cu)薄层的快速热退火(RTA)进行了石墨烯薄膜的合成。此外,我们研究了退火温度和退火时间对合成石墨烯薄膜的形成和质量的影响。拉曼光谱研究表明,在较低温度下退火导致形成单层石墨烯膜,而在较高温度下退火导致形成多层石墨烯膜。我们使用拉曼映射来确定石墨烯片的分布。石墨烯薄膜的表面形貌通过EDS探针的原子力显微镜和扫描电子显微镜研究。

相似文献

  • 外文文献
  • 中文文献
  • 专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号