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Hall effect measurement of InAsN alloy films grown directly on GaAs(001) substrates by RF-MBE

机译:通过RF-MBE直接在GaAs(001)基材上直接生长的InAsn合金薄膜的霍尔效应测量

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Due to the huge bandgap-bowing, a red shift of the band gap energy with increasing nitrogen content is expected for the InAsN alloy. However, a blue shift of the fundamental absorption edge has been observed in a recent study. This result seems to be significantly affected by the Burstein-Moss effect because the InAsN alloy has a large carrier concentration. The Burstein-Moss effect should be ruled out in order to characterize the real band gap energy. In this paper, Hall effect measurements were performed to estimate the carrier concentration of the InAsN alloy films and the Burstein-Moss shift energy was evaluated. Excluding the Burstein-Moss shift energy, a red shift of the real band-gap energy with increasing nitrogen content was observed.
机译:由于凸起的巨大的带隙弯曲,预期inasn合金的带隙能量随着氮含量增加的红色偏移。然而,在最近的一项研究中已经观察到基本吸收边缘的蓝色偏移。这种结果似乎受到伯斯坦 - 苔藓效应的显着影响,因为InAsn合金具有大的载体浓度。应该排除伯斯坦 - 苔藓效应,以表征真实的带隙能量。在本文中,进行了霍尔效应测量以估计InAsn合金薄膜的载流子浓度,并评估伯斯坦 - 苔藓换档能量。不包括Burstein-Moss换档能量,观察到具有增加氮含量的实际带间隙能量的红色移位。

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