首页> 外文会议>International Symposium on Advanced Packaging Materials: Processes, Properties and Interfaces Mar 11-14, 2001 Chateau Elan, Braselton, Georgia >A New Approach in the Development of No-Flow Underfill Materials for Both Eutectic and Lead-Free Solders with High Melting Temperature
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A New Approach in the Development of No-Flow Underfill Materials for Both Eutectic and Lead-Free Solders with High Melting Temperature

机译:高熔温度共晶和无铅焊料的无流动底部填充材料开发的新方法

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In recent years, no-flow underfill technology has been drawing more attention due to its potential advantages over conventional underfill technology, and several no-flow underfill materials have been developed and reported. However, most of these materials are not suitable for lead-free solder applications that usually have higher melting temperatures than the eutectic solder. Due to the increasing environmental concern, the demand for friendly lead-free solders has become an apparent trend. This paper demonstrated the study on two new formulas of no-flow underfill developed for lead-free solders with melting point around 220℃. As compared to the G25, a no-flow underfill material developed in our research group, which uses a solid metal chelate curing catalyst to match the reflow profile of eutectic solder (melting point 187℃), these novel formulas employ a liquid curing catalyst thus provides ease in preparation of the no-flow underfill materials and more choices in combining fluxing agents. In this study, the curing kinetics, glass transition temperature (Tg), thermal expansion coefficient (TCE), storage modulus (E′) and loss modulus (E″) of these materials were studied with differential scanning calorimetry (DSC), thermo-mechanical analysis (TMA), and dynamic-mechanical analysis (DMA), respectively. The pot-life in terms of viscosity of these materials was characterized with a stress rheometer. The adhesive strength of the material on the surface of silicon chip was studied with a die-shear instrument. The influences of fluxing agents on the materials curing kinetics were studied with DSC. The materials compatibility to the solder penetration and wetting on copper clad during solder reflow was investigated with both eutectic and no-lead solders on copper laminated FR-4 organic boards and heated in a reflow oven.
机译:近年来,由于不流动的底部填充技术比传统的底部填充技术具有潜在的优势,因此它引起了越来越多的关注,并且已经开发并报道了几种不流动的底部填充材料。但是,这些材料中的大多数都不适合通常具有比共晶焊料更高的熔化温度的无铅焊料应用。由于对环境的日益关注,对友好的无铅焊料的需求已成为显而易见的趋势。本文论证了为熔点为220℃左右的无铅焊料开发的两种新的无流量底部填充配方的研究。与我们研究小组开发的G25(一种不流动的底部填充材料)相比,它使用固体金属螯合固化催化剂来匹配低共熔焊料(熔点187℃)的回流曲线,这些新配方采用了液体固化催化剂,因此可轻松制备无流动性底部填充材料,并在组合助熔剂时提供更多选择。在这项研究中,使用差示扫描量热法(DSC),热-热分析法研究了这些材料的固化动力学,玻璃化转变温度(Tg),热膨胀系数(TCE),储能模量(E')和损耗模量(E'')。机械分析(TMA)和动态机械分析(DMA)。用应力流变仪表征了这些材料在粘度方面的适用期。用模切仪研究了材料在硅片表面上的粘合强度。用DSC研究了助熔剂对材料固化动力学的影响。使用铜层压FR-4有机板上的低共熔焊料和无铅焊料并在回流炉中加热,研究了材料在回流焊过程中对焊料渗透和覆铜润湿的材料兼容性。

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