首页> 外文会议>Conference on Gallium Nitride Materials and Devices; 20080121-24; San Jose,CA(US) >InGaN MQW Green LEDs Using p-InGaN and p-InGaN/p-GaN Superlattices as p-Type Layers
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InGaN MQW Green LEDs Using p-InGaN and p-InGaN/p-GaN Superlattices as p-Type Layers

机译:使用p-InGaN和p-InGaN / p-GaN超晶格作为p型层的InGaN MQW绿色LED

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High-efficiency "true" green light-emitting diodes (LEDs) (λ~550nm) are one of the key elements in realizing high-brightness RGB-based white-lighting systems. Because the InGaN multiple quantum wells (MQWs) in the active regions of green LEDs contain a high indium alloy composition and a corresponding large lattice mismatch, the QW has a reduced material quality and contains large piezoelectric fields induced by the large strain. The piezoelectric field reduces the overlap of the electron-hole wave functions, and so results in reduced internal quantum efficiency in green LEDs. In addition, other effects can strongly impact InGaN materials with high indium content, e.g., detrimental annealing of the MQW active region during the subsequent growth of the p-type hole injection and contact layers. In this study, the optical and structural characteristics of green LEDs employing p-InGaN and p-InGaN/p-GaN superlattices (SLs) were examined. For the LEDs with a p-In_(0.04)Ga_(0.96)N:Mg layer grown at 840 ℃, only a slight decrease in PL intensity was observed compared to similar structures grown without a p-layer. However, pits are observed for p-In_(0.04)Ga_(0.96)N:Mg layers, which may cause increased reverse current leakage. In order to decrease the reverse leakage current, p-In_xGa_(1-x)N/p-GaN SLs were developed. The hole concentration of the p-In_xGa_(1-x)N/p-GaN SLs is close to that of p-In_(0.04)Ga_(0.96)N, and is much higher than that of p-GaN grown at an acceptably low temperature. In addition, pits disappear in optimized p-In_xGai_(1-x)N/p-GaN SLs. In order to study the structural and optical characteristics of green LEDs with p-In_(0.04)Ga_(0.96)N and p-In_xGa_(1-x)N/p-GaN SL layers, I-V characterization and electroluminescence measurements were performed and the results will be described in detail.
机译:高效“真”绿色发光二极管(LED)(λ〜550nm)是实现基于RGB的高亮度白光照明系统的关键要素之一。因为绿色LED的有源区中的InGaN多量子阱(MQW)包含高铟合金成分和相应的大晶格失配,所以QW的材料质量降低,并且包含由大应变引起的大压电场。压电场减少了电子-空穴波函数的重叠,因此导致绿色LED的内部量子效率降低。另外,其他影响也会强烈影响具有高铟含量的InGaN材料,例如,在随后的p型空穴注入和接触层生长过程中,对MQW有源区进行有害的退火处理。在这项研究中,研究了采用p-InGaN和p-InGaN / p-GaN超晶格(SLs)的绿色LED的光学和结构特性。对于在840℃下生长的p-In_(0.04)Ga_(0.96)N:Mg层的LED,与没有p层生长的类似结构相比,PL强度仅略有下降。但是,对于p-In_(0.04)Ga_(0.96)N:Mg层观察到了凹坑,这可能会导致反向电流泄漏增加。为了减小反向漏电流,开发了p-In_xGa_(1-x)N / p-GaN SLs。 p-In_xGa_(1-x)N / p-GaN SLs的空穴浓度接近p-In_(0.04)Ga_(0.96)N的空穴浓度,并且比以可接受的速率生长的p-GaN的空穴浓度高得多。低温。此外,在优化的p-In_xGai_(1-x)N / p-GaN SLs中,凹坑消失了。为了研究具有p-In_(0.04)Ga_(0.96)N和p-In_xGa_(1-x)N / p-GaN SL层的绿色LED的结构和光学特性,进行了IV表征和电致发光测量,结果将被详细描述。

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