METHOD FOR MANUFACTURING PHOTOMASK, LITHOGRAPHY APPARATUS, METHOD OF MANUFACTURING DISPLAY DEVICE, INSPECTION METHOD OF PHOTOMASK SUBSTRATE AND INSPECTION APPARATUS OF PHOTOMASK SUBSTRATE

摘要

The improvement of the coordinate accuracy in the manufacture of a photomask can be performed more efficiently. A method of manufacturing a photomask having a transfer pattern based on design drawing data W1 on a first main surface of a transparent substrate, wherein a photomask substrate in which a thin film and a resist film are stacked on the first main surface is placed on a stage of a drawing apparatus. And, a drawing process for performing drawing on the photomask substrate, and a process for patterning a thin film using a resist pattern formed by developing a resist film. In the drawing process, the drawing apparatus affects the shape of the photomask substrate. Drawing device specific data M1 indicating the amount of deformation and back surface data S2 indicating the shape of the second main surface of the photomask substrate are prepared, and the coordinate shift composition amount D1 caused by the drawing device specific data M1 and the back surface data S2 is designated as the design drawing data W1. Is reflected, and a transfer pattern is drawn on the photomask substrate.