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METHOD FOR MANUFACTURING PHOTOMASK, DRAWING APPARATUS, METHOD FOR MANUFACTURING DISPLAY DEVICE, INSPECTION METHOD FOR PHOTOMASK SUBSTRATE, AND INSPECTION APPARATUS FOR PHOTOMASK SUBSTRATE
METHOD FOR MANUFACTURING PHOTOMASK, DRAWING APPARATUS, METHOD FOR MANUFACTURING DISPLAY DEVICE, INSPECTION METHOD FOR PHOTOMASK SUBSTRATE, AND INSPECTION APPARATUS FOR PHOTOMASK SUBSTRATE
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机译:制造光电掩模的方法,绘图设备,制造显示装置的方法,光电衬底的检查方法以及光电衬底的检查设备
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摘要
PROBLEM TO BE SOLVED: To efficiently improve accuracy of coordinates in manufacturing a photomask.SOLUTION: A method for manufacturing a photomask is provided, where the photomask has a transfer pattern based on designed drawing data W1 on a first major surface of a transparent substrate, and the method includes: a step of mounting a photomask substrate having a thin film and a resist film deposited on the first major surface thereof, on a stage of a drawing apparatus; a drawing step of drawing a pattern on the photomask substrate; and a step of patterning the thin film by using the resist pattern formed by developing the resist film. In the drawing step, drawing apparatus-specific data M1 representing a deformation amount imparted by the drawing apparatus to the shape of the photomask substrate, and back face data S2 representing a second major surface shape of the photomask substrate are prepared; and the transfer pattern is drawn on the photomask substrate by reflecting a coordinate misalignment synthesized amount D1 caused by the drawing apparatus-specific data M1 and the back face data S2 on the designed drawing data W1.SELECTED DRAWING: Figure 3
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