PROBLEM TO BE SOLVED: To efficiently improve accuracy of coordinates in manufacturing a photomask.SOLUTION: A method for manufacturing a photomask is provided, where the photomask has a transfer pattern based on designed drawing data W1 on a first major surface of a transparent substrate, and the method includes: a step of mounting a photomask substrate having a thin film and a resist film deposited on the first major surface thereof, on a stage of a drawing apparatus; a drawing step of drawing a pattern on the photomask substrate; and a step of patterning the thin film by using the resist pattern formed by developing the resist film. In the drawing step, drawing apparatus-specific data M1 representing a deformation amount imparted by the drawing apparatus to the shape of the photomask substrate, and back face data S2 representing a second major surface shape of the photomask substrate are prepared; and the transfer pattern is drawn on the photomask substrate by reflecting a coordinate misalignment synthesized amount D1 caused by the drawing apparatus-specific data M1 and the back face data S2 on the designed drawing data W1.SELECTED DRAWING: Figure 3
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