Manufacturing Methods and Technology Measure. Ultraprecision Integrated-Circuit Photomasks.

摘要

The objective of the manufacturing methods and technology measure (MMT) was to establish and demonstrate production techniques for ultraprecision integrated-circuit (IC) photomasks. The effectiveness of these techniques was to be verified by demonstrating the production capability for producing photomasks to a high degree of image accuracy. The effectiveness was to be further demonstrated by using the ultraprecision photomasks to manufacture IC's having better quality and higher yield. Engineering samples of photomask sets were manufactured and delivered to the contracting agency and to an in-house transistor wafer manufacturing area for pilot-line-production runs and evaluation of improved capabilities as the manufacturing methods and technology program progressed. This final report documents the successful accomplishment of all the goals of this MMT.