【24h】

Effect of processor temperature on film dosimetry

机译:处理器温度对胶片剂量的影响

获取原文
获取原文并翻译 | 示例
       

摘要

Optical density (OD) of a radiographic film plays an important role in radiation dosimetry, which depends on various parameters, including beam energy, depth, field size, film batch, dose, dose rate, air film interface, postexposure processing time, and temperature of the processor. Most of these parameters have been studied for Kodak XV and extended dose range (EDR) films used in radiation oncology. There is very limited information on processor temperature, which is investigated in this study. Multiple XV and EDR films were exposed in the reference condition (d max., 10 × 10 cm 2, 100 cm) to a given dose. An automatic film processor (X-Omat 5000) was used for processing films. The temperature of the processor was adjusted manually with increasing temperature. At each temperature, a set of films was processed to evaluate OD at a given dose. For both films, OD is a linear function of processor temperature in the range of 29.4-40.6°C (85-105°F) for various dose ranges. The changes in processor temperature are directly related to the dose by a quadratic function. A simple linear equation is provided for the changes in OD vs. processor temperature, which could be used for correcting dose in radiation dosimetry when film is used.
机译:射线照相胶片的光密度(OD)在辐射剂量测定中起着重要作用,它取决于各种参数,包括光束能量,深度,视野大小,胶片批次,剂量,剂量率,空气胶片界面,曝光后处理时间和温度处理器。这些参数中的大多数已针对放射肿瘤学中使用的柯达XV和扩展剂量范围(EDR)胶片进行了研究。关于处理器温度的信息非常有限,本研究对此进行了调查。在参考条件下(d max。,最大10×10 cm 2,100 cm),将多个XV和EDR胶片曝光至给定剂量。使用自动胶片冲洗机(X-Omat 5000)冲洗胶片。随着温度的升高,手动调节处理器的温度。在每个温度下,处理一组薄膜以评估给定剂量下的OD。对于两种薄膜,OD值是处理器温度在各种剂量范围内的29.4-40.6°C(85-105°F)范围内的线性函数。处理器温度的变化通过二次函数与剂量直接相关。提供了一个简单的线性方程,用于处理OD与处理器温度的变化,当使用胶片时,可用于校正辐射剂量学中的剂量。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号