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Processing, microstructure and thermomechanical behavior of superelastic nickel-titanium thin films sputter-deposited at elevated temperatures.

机译:在高温下溅射沉积的超弹性镍钛薄膜的加工,微观结构和热机械行为。

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摘要

ear-equiatomic NiTi is capable of fully recoverable strains associated with the formation and reversion of a stress-induced martensite phase from a B2 (CsCl) parent phase. Recently, sputter-deposited NiTi thin films have drawn attention for potential application to microactuators in microelectromechanical systems(MEMS). As-sputtered NiTi films are amorphous when deposition temperature is below 0.4;A series of NiTi films were sputter deposited at various substrate temperatures between 573 K and 773 K using a Ni;A fully crystallized NiTi film could be produced at a deposition temperature of 623 K which is about 150 K lower than the minimum temperature to form B2 phase by post-deposition annealing in a reasonable time. Crystalline films displayed microstructures consisting of very fine columnar B2 grains with 0.1-0.3
机译:耳部等原子的NiTi能够完全恢复与应力诱导的马氏体相从B2(CsCl)母体相的形成和回复相关的应变。近来,溅射沉积的NiTi薄膜已经吸引了潜在的在微机电系统(MEMS)中的微致动器的应用。当沉积温度低于0.4时,溅射的NiTi膜是非晶态的;使用Ni在573 K和773 K之间的各种衬底温度下溅射沉积一系列的NiTi膜;可以在623的沉积温度下生产出完全结晶的NiTi膜通过在合理的时间内进行后沉积退火形成B2相的最低温度,K大约比最低温度低150K。结晶膜显示出由非常细的柱状B2晶粒(0.1-0.3)组成的微观结构

著录项

  • 作者

    Hou, Li.;

  • 作者单位

    Michigan State University.;

  • 授予单位 Michigan State University.;
  • 学科 Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 1998
  • 页码 266 p.
  • 总页数 266
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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