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Characterization of Ni-Doped BST Thin Films on LSCO Buffer Layers Prepared by Pulsed Laser Deposition

机译:通过脉冲激光沉积在LSCO缓冲层上掺杂Ni的BST薄膜的表征

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摘要

We report on the effect of Ni doping on the tunability and dielectric loss of perovskite Ba_(0.6)Sr_(0.4)TiO_5 (BST) thin films with the change of Ni doping concentration. BST thin films were deposited on At/Ti/SiO_2/Si and La_(0.5)Sr_(0.5)CoO_3 (LSCO)/At/SiO_2/Si substrates by pulsed laser deposition. At an applied electric field of 143 kV/cm, the tunability values of BST films grown on At and LSCO/At were 12.6 and 62.8 percent at 100 kHz, respectively. The Ni doping effects were studied for BST thin films grown on LSCO buffer layer. With 1 percent Ni-doped BST thin films, results gave a tunability of 54.2 percent, a loss tangent as low as 0.0183, and a figure of merit of about 30. This work demonstrates a potential use for 1 mol percent Ni-doped BST thin films in tunable microwave devices.
机译:我们报道了随着Ni掺杂浓度的变化,Ni掺杂对钙钛矿Ba_(0.6)Sr_(0.4)TiO_5(BST)薄膜的可调性和介电损耗的影响。通过脉冲激光沉积将BST薄膜沉积在At / Ti / SiO_2 / Si和La_(0.5)Sr_(0.5)CoO_3(LSCO)/ At / SiO_2 / Si衬底上。在143 kV / cm的施加电场下,在At和LSCO / At上生长的BST膜在100 kHz时的可调性值分别为12.6%和62.8%。研究了在LSCO缓冲层上生长的BST薄膜的Ni掺杂效应。使用1%的Ni掺杂的BST薄膜,结果可调谐度为54.2%,损耗角正切低至0.0183,品质因数约为30。这项工作证明了1 mol%的Ni掺杂BST薄膜的潜在用途可调微波设备中的胶片。

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