首页> 外国专利> Thin film layer deposition - using acoustic waves formed by local pulsed heating at substrate surface through laser beams

Thin film layer deposition - using acoustic waves formed by local pulsed heating at substrate surface through laser beams

机译:薄膜层沉积-使用通过激光束在基板表面进行局部脉冲加热而形成的声波

摘要

In the development of thin film layers, together with photo-acoustic assistance, acoustic waves are directed across the surface of the substrate to be coated during deposition. The waves are formed by local pulsed heating through laser beams directed at the substrate. USE/ADVANTAGE - The thin film layers are deposited for special applications with specific characteristics such as conductivity, magnetic, piezo-electric, ferro-electric, optical etc. The technique does not require interdigital converters to deposit thin film layers. The acoustic waves give thin film layer deposition on substrates which are not piezo-electric.
机译:在薄膜层的发展中,连同光声辅助一起,在沉积过程中,声波被引导穿过要涂覆的基底表面。这些波是通过对着衬底的激光束进行局部脉冲加热而形成的。使用/优点-沉积薄膜层用于具有特定特性的特殊应用,例如导电性,磁性,压电,铁电,光学等。该技术不需要叉指式转换器来沉积薄膜层。声波使薄膜层沉积在非压电基板上。

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