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Nanoscaled electrical homogeneity of indium zinc oxide films

机译:铟锌氧化物薄膜的纳米尺度电均质性

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摘要

We are able to fabricate both polycrystalline and amorphous indium zinc oxide thin films. All the thin films exhibited an n-type semiconductor behavior with room-temperature conductivities in the range of 2.5 x 10~3 - 1.58 x 10~3 (Ω cm)~(-1). A nanoscaled conductivity inhomogeneity was observed in polycrystalline films by means of conducting atomic force microscopy, with morphology effect excluded by simultaneous topographic mapping. This effect has been explained in the presence of highly conducting In_2O_3 and Zn_2In_2O_5 nano crystalline phases imbedded in amorphous matrix. On the other hand, excellent electrical homogeneity throughout the amorphous film was observed, suggesting its promising potential in microelectronic device applications.
机译:我们能够制造多晶和非晶氧化铟锌薄膜。所有薄膜均表现出n型半导体行为,其室温电导率在2.5×10〜3-1.58×10〜3(Ω·cm)〜(-1)的范围内。通过进行原子力显微镜在多晶膜中观察到纳米级电导率不均匀性,同时形貌图排除了形态学效应。在嵌入非晶基质中的高导电In_2O_3和Zn_2In_2O_5纳米晶相的存在下,可以解释这种效应。另一方面,观察到整个非晶膜具有优异的电均质性,表明其在微电子器件应用中的潜力很大。

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