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The Surface Morphology and Nanoscale Electrical Conductivity Studies of the Chemical Etching and Laser Annealing Processed Indium-Tin-Oxide films

机译:化学蚀刻和激光退火加工铟 - 锡氧化膜的表面形态和纳米级电导率研究

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摘要

The surface morphology and surface conductivity of the chemical etching and excimer laser ablation processed Indium-Tin-Oxide films have been studied by the atomic force microscopy (AFM) and the current sensing atomic force microscopy (CSAFM). AFM and CSAFM image observations show that chemical etching and laser ablation processes can effectively get rid of surface contaminations but these processes cannot reduce the surface roughness.
机译:通过原子力显微镜(AFM)和电流检测原子力显微镜(CSAFM)研究了化学蚀刻和准分子激光烧蚀处理过的铟 - 氧化钛膜的表面形态和表面电导率。 AFM和CSAFM图像观察表明,化学蚀刻和激光烧蚀过程可以有效地摆脱表面污染,但这些过程不能降低表面粗糙度。

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