首页> 外文会议>Symposium Proceedings vol.886; Symposium on Materials and Technologies for Direct Thermal-to-Electric Energy Conversion; 20051128-1202; Boston,MA(US) >Transient Harman Measurement of the Cross-plane ZT of InGaAs/InGaAlAs Superlattices with Embedded ErAs Nanoparticles
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Transient Harman Measurement of the Cross-plane ZT of InGaAs/InGaAlAs Superlattices with Embedded ErAs Nanoparticles

机译:嵌入ErAs纳米粒子的InGaAs / InGaAlAs超晶格横断面ZT的瞬态Harman测量

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The transient Harman technique is used to characterize the cross-plane ZT of InGaAs/InGaAlAs superlattice structures with embedded ErAs nanoparticles in the well layers. ErAs nanoparticles have proven to substantially reduce the thermal conductivity while slightly increasing the electrical conductivity of bulk InGaAs. The InGaAs/InGaAlAs superlattice structure was designed to have a barrier height of approximately 200meV. Although ErAs nanoparticles provide free carriers inside the semiconductor matrix, additional doping with Si increased the Fermi energy to just below the barrier height. The bipolar transient Harman technique was used to measure device ZT of samples with different superlattice thicknesses in order to extract the intrinsic cross-plane ZT of the superlattice by eliminating the effects of device Joule heating and parasitics. High-speed packaging is used to reduce signal ringing due to electrical impedance mismatch and achieve a short time resolution of roughly 100ns in transient Seebeck voltage measurement. The measured intrinsic cross-plane ZT of the superlattice structure is 0.13 at room temperature. This value agrees with calculations based on the Boltzmann transport equation and direct measurements of specific film properties. Theoretical calculations predict cross-plane ZT of the superlattice to be greater than 1 at temperatures greater than 700K.
机译:瞬态哈曼技术用于表征阱层中嵌入有ErAs纳米粒子的InGaAs / InGaAlAs超晶格结构的横断面ZT。业已证明,ErAs纳米颗粒可显着降低热导率,同时略微增加块状InGaAs的电导率。 InGaAs / InGaAlAs超晶格结构设计为具有约200meV的势垒高度。尽管ErAs纳米颗粒在半导体基质内部提供了自由载流子,但是额外的Si掺杂将费米能提高到势垒高度以下。为了消除器件的焦耳热和寄生效应,使用双极瞬态哈曼技术测量具有不同超晶格厚度的样品的器件ZT,以提取该超晶格的固有横断面ZT。高速封装用于减少由于电阻抗失配而引起的信号振铃,并在瞬态塞贝克电压测量中获得大约100ns的短时间分辨率。在室温下测得的超晶格结构的本征横截面ZT为0.13。该值与基于玻尔兹曼输运方程的计算以及对特定膜性质的直接测量相符。理论计算预测,在高于700K的温度下,超晶格的横切面ZT大于1。

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