Dept. of Micro Engineering, Kyoto University, Kyoto daigaku-Katsura, Nishikyo-ku, Kyoto 615-8540, Japan;
Dept. of Micro Engineering, Kyoto University, Kyoto daigaku-Katsura, Nishikyo-ku, Kyoto 615-8540, Japan;
Dept. of Micro Engineering, Kyoto University, Kyoto daigaku-Katsura, Nishikyo-ku, Kyoto 615-8540, Japan;
Dept. of Precision and Microsystems Engineering, Delft University of Technology, Mekelweg 2, 2628 CD Delft, The Netherlands;
Dept. of Precision and Microsystems Engineering, Delft University of Technology, Mekelweg 2, 2628 CD Delft, The Netherlands;
Dept. of Micro Engineering, Kyoto University, Kyoto daigaku-Katsura, Nishikyo-ku, Kyoto 615-8540, Japan;
Dept. of Micro Engineering, Kyoto University, Kyoto daigaku-Katsura, Nishikyo-ku, Kyoto 615-8540, Japan;
3D microstructuring; 3D photolithography; DMD-based grayscale lithography; Optimization; Lithography simulation; Thick photoresist; Fast Marching Method;
机译:基于DMD灰度光刻的3D微结构数值优化的实验研究
机译:使用新开发的数字镜面设备光刻设备在深蚀刻或倾斜表面上进行无掩模光刻精细图案化以及灰度光刻
机译:基于DMD的无掩模光刻中Dammann光栅的快速原型设计
机译:基于DMD的无掩模灰度光刻系统的3D光刻工艺优化方法
机译:利用基于图像的格式,以优化模式数据格式和掩模和掩模模式生成光刻的处理
机译:利用PW-LDPE-SA粘结剂系统对基于挤压的3D金属印刷工艺参数进行优化
机译:基于DMD的无掩模灰度光刻系统的3D光刻工艺优化方法
机译:无掩模光刻的方法和装置。