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Subthreshold Degradation of 2D material Junctionless FETs -Impact of Fringe Field from Source/Drain Electrodes through Insulator-

机译:通过绝缘体从源极/漏电电极劣化2D材料连接FET的借调劣化。

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We perform Technology computer-aided (TCAD) simulations for 2D material based Junctionless FET (JLFET) and investigate the effect of the fringe-field interaction between the source/drain (S/D) electrodes and the 2D channel. We find that subthreshold slope (SS) gets worse by the fringe-field interaction, and the degradation of the SS becomes serious when the work function difference becomes large. Interestingly, we also find that high drain voltage recovers the degradation of the SS.
机译:我们对基于2D材料的连接FET(JLFET)进行技术计算机辅助(TCAD)模拟,并研究源极/漏极(S / D)电极和2D通道之间的边缘场相互作用的效果。我们发现,当工作函数差异变大时,SS的亚阈值斜率(SS)变差,并且SS的劣化变得严重。有趣的是,我们还发现高漏极电压恢复了SS的劣化。

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