Si Surface Orientation Dependence of SiC Nano-Dot Formation in Hot-C+ -Ion Implanted Bulk-Si Substrate

摘要

We experimentally studied the Si surface orientation dependence of SiC nano-dot formation in a hot-C^{+-ion implanted bulk-Si substrate (C+-bulk Si), to analyze the effects of Si atom surface density on SiC nano-dot formation in Si and the photoluminescence (PL) property. We successfully demonstrated SiC dot formation even in (110) and (111) C+-bulk Si, too. SiC dot size and density of (110) C+-bulk Si is larger than those of (100) C+-bulk Si. The photoluminescence (PL) properties of C+-bulk Si strongly depend on the Si surface orientation, and the PL intensity is the minimum in (110) C+-bulk Si with lowest Si atom surface density.}