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Characterization of Non-Polar Surfaces in HVPE Grown Gallium Nitride

机译:HVPE生长氮化镓中非极性表面的表征

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Non-polar surfaces of HVPE grown GaN were characterized by cathodoluminescence (CL), scanning electron microscopy (SEM), and secondary ion mass spectrometry (SIMS). Both of a- and m-plane GaN were prepared by growing thick GaN along the c-axis, and cutting in transverse orientations. The exposed non-polar surfaces were prepared by mechanical polishing (MP) and chemically mechanical polishing (CMP). Non-uniform luminescent characteristics on a- and m-plane GaN were observed in CL images, indicating a higher concentration of impurities in the area of more luminescence. CL spectra from the bulk samples revealed two peaks: 364nm and 510nm, related to band edge and impurity defects respectively. The detection by SIMS confirmed that oxygen was inhomogeneously incorporated during the growth of thick GaN layers. Surface qualities of a- and m-plane GaN were also investigated. The lower optical intensities from a-plane GaN at low acceleration voltages indicated more surface damages were introduced during polish. The optical intensity difference from the two samples was reduced at higher acceleration voltages. Similar CL intensities at low acceleration voltages from a- and m-plane GaN substrates prepared by CMP indicated improved surface qualities.
机译:通过阴极致发光(CL),扫描电子显微镜(SEM)和二次离子质谱(SIMS)的非极性表面的非极性表面的特征在于。通过沿着C轴生长厚的GaN,并以横向切割来制备A-和M平面GaN。通过机械抛光(MP)和化学机械抛光(CMP)制备暴露的非极性表面。在CL图像中观察到A-和M平面GaN上的非均匀发光特性,表明在更多发光的面积中浓度较高的杂质。来自散装样品的Cl光谱显示出两个峰:364nm和510nm,分别与带边缘和杂质缺陷相关。 SIMS的检测证实氧气在厚GaN层的生长期间氧气不均匀地掺入。还研究了A-和M平面GaN的表面素质。在低加速电压下的平面GaN的较低光强度表示在抛光期间引入了更多的表面损坏。从两个样品的光学强度差异在较高的加速电压下降低。由CMP制备的A-和M平面GaN基板的低加速电压的类似CL强度指示改善的表面质量。

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