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Stencil mask layout pattern data division processing system, stencil mask layout pattern data division processing method, and program read by computer to execute stencil mask layout pattern data dividing process
Stencil mask layout pattern data division processing system, stencil mask layout pattern data division processing method, and program read by computer to execute stencil mask layout pattern data dividing process
A stencil mask layout pattern data division processing system, a method thereof and a program have a scheme of optimally dividing a complicated layout pattern. Plural pieces of divided layout pattern segment data are generated by reading stencil mask layout pattern data stored in a layout pattern data memory module and dividing the layout pattern data along line segments in horizontal and vertical directions. Then, plural pieces of complementary mask data are generated by allocating the plural pieces of divided layout pattern segment data to plural pieces of complementary mask data, and are stored in a complementary mask data memory module.
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