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Division processing method for drawing patterns, division processing unit of the drawing pattern, a writing method, the creation of mask methods, a method of manufacturing a semiconductor device, division processing program for drawing patterns and a computer-readable recording medium storing the program
Division processing method for drawing patterns, division processing unit of the drawing pattern, a writing method, the creation of mask methods, a method of manufacturing a semiconductor device, division processing program for drawing patterns and a computer-readable recording medium storing the program
PROBLEM TO BE SOLVED: To provide a method and an apparatus for partitioning a pattern for writing which enable to optimize the partition of a pattern rapidly without generating any variation in the same shape, method for writing, mask and method for making the same, semiconductor device and method for manufacturing the same, program for partitioning a pattern for writing and computer readable recording medium recorded with the program. SOLUTION: In the case of a pattern having a shape which has never been handled as a target for partition, the pattern data and the partition result are registered in a hash table of a storage device 11. Thereafter, whether or not a pattern to be processed now has the same shape as one of the registered patterns is judged by searching the hash table. When the pattern to be processed now is judged to have the same shape as one of the registered patterns, the partition result of the registered pattern is applied to the pattern.
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