Method for manufacturing multi-surface tensile strained Si strip, method for forming tensile strained Si multi-surface gate fin-type MOSFET, and method for forming processor

摘要

A method is disclosed for fabricating multifaceted, tensilely strained Si MOSFET (FinFET) devices. The method comprises the growing by selective epitaxy of a monocrystalline Si strip onto a monocrystalline SiGe layer sidewall surface, where the SiGe layer is bonded to a support platform, typically an insulator on a Si substrate, and where the Si strip also bonds to the support platform. The SiGe sidewall surface has a lattice constant which is larger than the relaxed lattice constant of Si, whereby the Si strip is in a tensilely strained state. Upon removing the SiGe monocrystalline layer the monocrystalline strained Si strip is turned into a multifaceted Si strip on the support platform, suitable for fabricating multifaceted gate FinFETs. Fabrication of processors with such FinFet devices is also disclosed.