首页> 外国专利> The reactant pulse forming method by manipulating the gas supply system, the valve assembly and valve assembly,

The reactant pulse forming method by manipulating the gas supply system, the valve assembly and valve assembly,

机译:通过操纵气体供应系统,阀组件和阀组件来形成反应物脉冲的方法,

摘要

PROBLEM TO BE SOLVED: To provide a gas supply system which can block reactants without influences of a dead space and tolerates lowering of sealing between a valve member and a valve seat without lowering the separation of pulses, while can be operated so as to output suitably separated pulses of the reactants.;SOLUTION: The gas supply system comprises a first valve 10 which is a 4-port diaphragm valve, and a second valve (not shown) which is arranged so that it allows a first port 30 to communicate with a discharge portion through fluid with the first valve 10 being open and that the fluid communication is stopped with the first valve 10 being closed. In a state where the reactants are flowed, the first valve 10 is open while the second valve is closed, and in a purged state, the first valve 10 is closed while the second valve is open.;COPYRIGHT: (C)2005,JPO&NCIPI
机译:解决的问题:提供一种气体供给系统,该气体供给系统能够在不影响死空间的情况下阻塞反应物,并且能够在不降低脉冲间隔的情况下容许阀部件与阀座之间的密封性降低,并且能够操作以适当地输出。解决方案:气体供应系统包括一个第一阀10(它是一个四通隔膜阀)和一个第二阀(未显示),该阀的布置使得它的第一端口30与一个通气阀连通。在第一阀10打开的情况下通过流体排出部分,并且在第一阀10关闭的情况下停止流体连通。在反应物流动的状态下,第一阀10打开而第二阀关闭;在净化状态下,第一阀10关闭而第二阀打开。版权所有(C)2005,JPO&NCIPI

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号