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The reactant pulse forming method by manipulating the gas supply system, the valve assembly and valve assembly,
The reactant pulse forming method by manipulating the gas supply system, the valve assembly and valve assembly,
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机译:通过操纵气体供应系统,阀组件和阀组件来形成反应物脉冲的方法,
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摘要
PROBLEM TO BE SOLVED: To provide a gas supply system which can block reactants without influences of a dead space and tolerates lowering of sealing between a valve member and a valve seat without lowering the separation of pulses, while can be operated so as to output suitably separated pulses of the reactants.;SOLUTION: The gas supply system comprises a first valve 10 which is a 4-port diaphragm valve, and a second valve (not shown) which is arranged so that it allows a first port 30 to communicate with a discharge portion through fluid with the first valve 10 being open and that the fluid communication is stopped with the first valve 10 being closed. In a state where the reactants are flowed, the first valve 10 is open while the second valve is closed, and in a purged state, the first valve 10 is closed while the second valve is open.;COPYRIGHT: (C)2005,JPO&NCIPI
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