ONIUM SALT COMPOUND CAPABLE OF PREPARING A POLYMER COMPOUND USEFUL FOR A CHEMICALLY AMPLIFIED RESIST COMPOUND SENSITIVE TO FAR ULTRAVIOLET RAYS, A POLYMER INCLUDING THE SAME, A CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND A PATTERNING METHOD USING THE CHEMICALLY AMPLIFIED RESIST COMPOSITION

摘要

PURPOSE: A chemically amplified resist composition is provided to ensure little dependability for a substrate, excellent adhesive property, good dry etching resistance, and excellent sensitivity, resolution, and development property.;CONSTITUTION: A compound has a structure represented by chemical formula 1. In chemical formula 1, R1 is hydrogen, trifluoromethyl, and C1-5 alkyl or C1-5 alkoxy; and A is represented by chemical formula 2 or 3. In chemical formula 2 or 3, R2, R3, R4, R5 and R6 are independently C1-20 substituted or unsubstituted alkyl group, C 3-10 substituted or unsubstituted aryl group, C1-10 substituted or unsubstituted perfluoroalkyl group, substituted or unsubstituted benzyl group, or C6-30 substituted or unsubstituted aryl group.;COPYRIGHT KIPO 2010