ONIUM SALT COMPOUND, POLYMER COMPOUND COMPRISING THE SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION COMPRISING THE POLYMER COMPOUND, AND METHOD FOR PATTERNING USING THE COMPOSITION.

摘要

ABSTRACTONIUM SALT COMPOUND, POLYMER COMPOUND COMPRISING THE SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION COMPRISING THE POLYMER COMPOUND, AND METHOD FOR PATTERNING USING THE COMPOSITIONA compound represented by the following formula (1) is provided:[Formula 1] [err]wherein R1 and A are defined in the Specification.The chemically amplified resist composition comprising a polymer compound which is produced from the compound of formula 1 according to the present invention provides a chemically amplified resist sensitive to far-ultraviolet radiation. The resist composition is less dependent on the substrate, and has excellent adhesiveness, excellent transparency in the subject wavelength region, and excellent dry etch resistance, and a resist pattern excellent in sensitivity, resolution and developability can be formed from the resist composition.Figure 1.