COATING AGENT FOR REDUCING ROUGHNESS OF RESIST PATTERN AND METHOD FOR FORMING RESIST PATTERN IN WHICH ROUGHNESS IS REDUCED

摘要

Provided is a coating agent capable of favorably reducing roughness in resist patterns. Moreover, provided is a method for producing roughness-reduced resist patterns, including a step of coating the resist patterns using the coating agent. The coating agent is used to reduce the roughness in the resist patterns by coating the resist patterns formed on a substrate, and uses a composition which contains a resin (A), a quaternary carbon atom-containing compound (B), and a solvent (S). The quaternary carbon atom-containing compound (B) is a compound having an aliphatic hydrocarbon group with 1 to 8 carbon atoms and a group in a specific structure to which a specific amount of ethylene oxide and/or propylene oxide are added.