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首页> 外文期刊>Semiconductors >Influence of Gate-to-source and Gate-to-drain Recesses on GaAs Camel-like Gate Field-effect Transistors~1
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Influence of Gate-to-source and Gate-to-drain Recesses on GaAs Camel-like Gate Field-effect Transistors~1

机译:栅源极和栅漏极凹槽对GaAs骆驼状栅场效应晶体管的影响〜1

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摘要

In this article, the characteristics of the GaAs homojunction camel-like gate field-effect transis- tors with and without the gate-to-source and gate-to-drain recesses structures are first investigated and com- pared. As to the device without the recesses structure, a second channel within the n~+-GaAs cap layer is formed at large gate bias, which could enhance the drain output current and transconductance. Furthermore, a two-stage relationship between drain current (and transconductance) versus gate voltage is observed in the recesses structure. The simulated results exhibit a maximum drain saturation current of 447 (351 mA/mm) and a maximum transconductance of 525 (148 mS/mm) in the studied device without (with) the recesses structure. Consequentially, the demonstration and comparison of the variable structures provide a promise for design in circuit applications.
机译:在本文中,首先研究并比较了具有和不具有栅极至源极和栅极至漏极凹槽结构的GaAs同质结骆驼状栅极场效应晶体管的特性。对于不具有凹槽结构的器件,在n _ +-GaAs盖层内的第二沟道以较大的栅极偏压形成,这可以增强漏极输出电流和跨导。此外,在凹槽结构中观察到漏极电流(和跨导)与栅极电压之间的两级关系。在没有(带有)凹口结构的被研究器件中,模拟结果显示最大漏极饱和电流为447(351 mA / mm),最大跨导为525(148 mS / mm)。因此,可变结构的演示和比较为电路应用中的设计提供了希望。

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