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首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Facile fabrication of p-type CuxS transparent conducting thin films by metal sulfide precursor solution approach and their application in quantum dot thin films
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Facile fabrication of p-type CuxS transparent conducting thin films by metal sulfide precursor solution approach and their application in quantum dot thin films

机译:通过金属硫化物前体溶液方法进行P型CuxS透明透明的P型Cuxs透明的制造及其在量子点薄膜中的应用

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摘要

We present a facile route for the fabrication of P-type CuxS transparent and conducting thin films (TCTFs) using copper (I) oxide and butyl-dithiocarbamic acid as precursors by pulling method on glass. The as-deposited highly conductive crystalline CuxS films showed high carrier concentration (similar to 3.11 x 10(22) cm(-3)), low electrical resistivity (similar to 1.02 x 10(-4) Omega cm) and conclusive p-type conduction. Xray diffraction studies showed high crystallinity, and the optical transmission spectra in UV-vis-NIR region of such films were recorded, indicating that the transparency was over 75% with a band gap of 1.52 eV. The room-temperature sheet resistance increased from 9.9 to 302.4 Omega sq(-1) with increasing baking temperature. The CuxS/quantum dot bifacial thin films have been fabricated, and the experimental results indicated that luminescent, transparent, and conductive CuxS/Cu-doped ZnyCd1-yS thin films have a very high potential application in thin film solar cells. (C) 2017 Elsevier B.V. All rights reserved.
机译:我们介绍了使用铜(I)氧化铜(I)氧化物和丁基二硫代氨基酸作为前体的P型Cuxs透明和传导薄膜(TCTF)的容纳途径。沉积的高导电晶体CUXS膜显示出高载体浓度(类似于3.11×10(22 )cm(-3)),电阻率低(类似于1.02×10(-4)ωcm)和结论性p型传导。 X射线衍射研究显示出高结晶度,并且记录了这种薄膜的UV-Vis-NIR区域中的光学透射光谱,表明透明度超过75%,带隙为1.52eV。室温薄层电阻从9.9〜302.4ωSq(-1)增加,烘烤温度升高。已经制造了Cuxs /量子点双薄膜薄膜,实验结果表明发光,透明和导电的Cuxs / Cu掺杂的Znycd1-ys薄膜在薄膜太阳能电池中具有非常高的潜在应用。 (c)2017年Elsevier B.V.保留所有权利。

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