首页> 外文期刊>Dalton transactions: An international journal of inorganic chemistry >The deposition of cadmium selenide and cadmium phosphide thin films from cadmium thioselenoimidodiphosphinate by AACVD and the formation of an aromatic species
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The deposition of cadmium selenide and cadmium phosphide thin films from cadmium thioselenoimidodiphosphinate by AACVD and the formation of an aromatic species

机译:通过AACVD从硫代硫代甲苯二甲酰胺磷酸镉和芳族物种的形成沉积硒化镉和镉磷化镉薄膜

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摘要

Aerosol-assisted chemical vapour deposition (AACVD) of Cd[((SPPr2)-Pr-i)((SePPr2)-Pr-i)N](2) yields hexagonal cadmium selenide and monoclinic cadmium phosphide films on glass substrates between 475 and 525 degrees C at different argon flow rates. The films were characterized by X-ray powder diffraction (XRD), scanning electron microscopy (SEM), energy dispersive analysis of X-rays (EDAX) and X-ray photoelectron spectroscopy (XPS). All the results of XRD, EDAX and XPS are in agreement with our previous investigations on Cd[((SePPr2)-Pr-i)(2)N](2). A breakdown mechanism is proposed based on mass spectra and density functional theory calculations. A large peak at m/z 207 in the mass spectra, previously assigned by us as a new aromatic species, is also observed for this complex.
机译:Cd的气溶胶辅助化学气相沉积(((sppr2)-1-i)((seppr2)-1-i)n](2)在475和475之间的玻璃基板上产生六边形硒化族和单胶镉磷化镉膜。 不同氩流量速率的525摄氏度。 该薄膜的特征在于X射线粉末衍射(XRD),扫描电子显微镜(SEM),X射线(eDAX)和X射线光电子谱(XPS)的能量分散分析。 XRD,EDAX和XPS的所有结果都与我们对CD的先前调查进行了一致,[((SEPPR2)-1-i)(2)n](2)。 基于质谱和密度泛函理论计算提出了击穿机制。 对于该综合体,也观察到以前被美国作为新的芳族物种分配的M / Z 207的大峰。

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