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首页> 外文期刊>Journal of solid state electrochemistry >Epitaxial electrodeposition of cadmium selenide thin films on indium phosphide single crystal
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Epitaxial electrodeposition of cadmium selenide thin films on indium phosphide single crystal

机译:磷化铟单晶上硒化镉薄膜的外延电沉积

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摘要

Epitaxial CdSe layers were electrodeposited from a standard aqueous electrolyte onto a (111) InP single crystal. By using various characterization techniques (RHEED, XRD, HREM,...) it was demonstrated that a good epitaxy can be achieved by monitoring the experimental parameters very carefully, in particular the selenium concentration in the electrolyte and the deposition potential. For optimum conditions, the composition of the semiconducting layer is close to stoichiometry and the carrier density is around 1 2 1017 cmm3.
机译:从标准水性电解质将外延CdSe层电沉积到(111)InP单晶上。通过使用各种表征技术(RHEED,XRD,HREM等),证明了通过非常仔细地监视实验参数(特别是电解质中的硒浓度和沉积电位)可以实现良好的外延。对于最佳条件,半导体层的组成接近化学计量,载流子密度约为1 2 1017 cmm3。

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