...
首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Characterization of AgGa_(0.5)In_(0.5)Se_2 thin films deposited by electron-beam technique
【24h】

Characterization of AgGa_(0.5)In_(0.5)Se_2 thin films deposited by electron-beam technique

机译:电子束技术沉积AgGa_(0.5)In_(0.5)Se_2薄膜的表征

获取原文
获取原文并翻译 | 示例
           

摘要

AgGa_(0.5)In_(0.5)Se_2 thin films were deposited onto a quartz substrate by the electron-beam technique. For the investigation of the annealing effect on structural, optical and electrical properties of deposited films, samples were annealed in the temperature range 300-775 ℃. The composition analyses ct the deposited films carried out by energy dispersive x-ray analysis measurements have shown that the deposited AgGa_(0.5)In_(0.5)Se_2 films were indium- and gallium-rich but sejenium- and slightly silver-deficient and there was a remarkable change in composition withfinnealing. As a result of x-ray diffraction measurements, the as-deposited films were found to have an -morphous structure and after annealing at 300 ℃ a polycrystalline structure with different phases was observed. However, subsequent annealing resulted in the formation of single phase AgGa_(0.5)In_(0.5)Se_2 thin film at about 775 ℃. The absorption coefficient of the films was determined from the transmission spectra and the band gap values were calculated and found to vary between 1.57 and 2.43 eV following annealing in the temperature range 300-775 ℃. The refractive index (n) and extinction coefficient (k) of the films were evaluated by applying the envelope method to the transmission spectra. The spectral distributions of these quantities for both as-deposited and annealed films were determined in detail and it was observed that there has been a remarkable influence of annealing on these quantities. The electrical properties of AgGa_(0.5)In_(0.5)Se_2 thin films were also investigated by means of temperature dependent conductivity measurements in the temperature range 100-460 K. The resistivity of the samples depending on the annealing temperature varied between 6.5 x 10~5 and 16 Ωcm. As a result of the hot-probe method it was observed that the as-deposited films have indicated an n-type behaviour, while all the annealed AgGa_(0.5)In_(0.5)Se_2 thin films have shown p-type conduction.
机译:通过电子束技术将AgGa_(0.5)In_(0.5)Se_2薄膜沉积到石英基板上。为了研究退火对沉积膜的结构,光学和电性能的影响,在300-775℃的温度范围内对样品进行退火。通过能量色散x射线分析测量对沉积膜进行的成分分析表明,沉积的AgGa_(0.5)In_(0.5)Se_2膜富含铟和镓,但缺乏硒和银,并且存在修饰后,成分发生了显着变化。 X射线衍射测量的结果表明,沉积的薄膜具有非晶结构,在300℃退火后,观察到具有不同相的多晶结构。然而,随后的退火导致在约775℃下形成单相AgGa_(0.5)In_(0.5)Se_2薄膜。由透射光谱确定膜的吸收系数,并计算带隙值,发现在300-775℃的温度范围内退火后,其带隙值在1.57和2.43 eV之间变化。通过将包络法应用于透射光谱来评价膜的折射率(n)和消光系数(k)。详细确定了沉积和退火薄膜的这些量的光谱分布,发现退火对这些量有显着影响。 AgGa_(0.5)In_(0.5)Se_2薄膜的电性能也通过在100-460 K的温度范围内进行随温度变化的电导率测量来研究。样品的电阻率取决于退火温度,变化范围为6.5 x 10〜 5和16Ωcm。作为热探针法的结果,观察到沉积的膜显示出n型行为,而所有退火的AgGa_(0.5)In_(0.5)Se_2薄膜均显示出p型导电性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号