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Photon-assisted electronic transitions in phosphorus-doped n-type chemical vapor deposition diamond films

机译:磷掺杂n型化学气相沉积金刚石薄膜中的光子辅助电子跃迁

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One year ago we published the first results on the electronic structure of the P-level in 1000 ppm PH_3/CH_4 doped {111}-oriented n-type diamond films, using the quasi-steady-state photocurrent technique (PC) and photothermal ionization spectroscopy (PTIS). In this work we have extended our measurements at various temperatures (4.2-77.4 K) to samples with various doping levels (100, 500 and 1000 ppm PH_3/CH_4). This allowed us to obtain more precise results for the electronic structure of the phosphorus defect in homoepitaxial n-type CVD diamond films, making use of the 155 meV LO-photon to explain the oscillatory photoconductivity. These results are confirmed by the PTIS maxima and Fourier transform infra-red (FTIR) data. In addition we present first measurements on a 2000-ppm doped {100}-oriented sample.
机译:一年前,我们使用准稳态光电流技术(PC)和光热电离技术,发布了1000 ppm PH_3 / CH_4掺杂{111}取向的n型金刚石薄膜中P级电子结构的第一个结果。光谱学(PTIS)。在这项工作中,我们将在各种温度(4.2-77.4 K)下的测量范围扩展到了具有不同掺杂水平(PH_3 / CH_4为100、500和1000 ppm)的样品。这使我们能够利用155 meV LO光子来解释振荡光电导性,从而获得同质外延n型CVD金刚石膜中磷缺陷的电子结构的更精确结果。 PTIS最大值和傅立叶变换红外(FTIR)数据证实了这些结果。另外,我们介绍了对2000 ppm掺杂{100}取向样品的首次测量。

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