Next generation light exposure technology: EUV

摘要

The basics for the next generation light exposure technology using extreme ultraviolet (EUV) light whose wavelength is a tenth as short as that of optically exposed light are beginning to take shape. The Association of Super Advanced Electronics Technologies (ASET) has recently established a reflective masking technology for EUV exposure. ASET has already achieved advanced development stages concerning the nonspherical reflective mirror measurement technology, which is absolutely necessary for basic resist technology for EUV light or exposure devices, so the latest accomplishment indicates that ASET has solved basic problems in three elemental technological fields: exposure devices, masks, and resist, and also that a realistic expectation may be placed in the near future on the establishment of an EUV exposure technology that allows for less than 70nm in LSI design rule.