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EUV light generation system and control method of EUV light generation system

机译:EUV光产生系统及EUV光产生系统的控制方法

摘要

A laser apparatus may include: an optical amplifier configured to amplify a laser beam outputted from a master oscillator; an optical-amplifier power supply configured to supply an alternating current for optical amplification to the optical amplifier; and a laser controller. The optical-amplifier power supply may include: an alternating current generation circuit including an inverter circuit configured to change output amplitude in accordance with a duty cycle, the alternating current generation circuit being configured to generate the alternating current from an output of the inverter circuit; and a power supply control circuit configured to hold control information defining correspondence relations between command values from the laser controller and duty cycles of the inverter circuit, determine a duty cycle corresponding to a command value received from the laser controller based on the control information, and provide the determined duty cycle to the inverter circuit.
机译:激光装置可以包括:光学放大器,被配置为放大从主振荡器输出的激光束;以及光学放大器。光放大器电源,被配置为向光放大器提供用于光放大的交流电;和激光控制器。所述光放大器电源可以包括:交流产生电路,其包括被配置为根据占空比改变输出幅度的逆变器电路,所述交流产生电路被配置为从所述逆变器电路的输出产生交流。电源控制电路,其被配置为保持控制信息,该控制信息定义了来自激光控制器的命令值与逆变器电路的占空比之间的对应关系,并基于该控制信息来确定与从激光控制器接收的命令值相对应的占空比,以及将确定的占空比提供给逆变器电路。

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