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Spectral characteristics of plane multilayer amplitude diffraction gratings for the soft x-ray range

机译:平面多层振幅衍射光栅在软X射线范围内的光谱特性

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Several spectral characteristics of plane multilayer amplitude molybdenum—silicon diffraction gratings (1000 and 2000 lines mm-1), fabricated by electron-beam lithography, were determined with a broadband laser-plasma source of soft x-rays. The gratings, with the multilayer structure period 11.5 nm, were investigated at near-normal incidence and at an angle of incidence of 36o in a quasi-stigmatic spectrograph system with moderate dispersion. The spectral profile of resonant reflection by the gratings was determined in the first and second interference orders of the multilayer structure for different angles of incidence. The line spectrum of multiply charged F(V) and F(VI) ions was recorded in the 16.0—18.5 nm range by means of these multilayer gratings and the resolving power of the gratings was estimated.
机译:用宽带X射线等离子软X射线源测定了通过电子束光刻法制备的平面多层振幅钼硅衍射光栅(1000和2000线mm-1)的几种光谱特性。在具有中等色散的准像散光谱仪中,以接近法线入射和36o入射角研究了多层结构周期为11.5 nm的光栅。对于不同的入射角,以多层结构的第一和第二干涉级确定了由光栅产生的共振反射的光谱轮廓。借助这些多层光栅,在16.0-18.5 nm范围内记录了带多重电荷的F(V)和F(VI)离子的线谱,并估算了光栅的分辨能力。

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