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Synthesis and molecular structures of cobalt(II) beta-diketonate complexes as new MOCVD precursors for cobalt oxide films

机译:β-二酮钴(II)钴氧化物膜的新型MOCVD前驱体的合成与分子结构

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摘要

Adducts of cobalt(II) 2,4-pentanedionate (acac) and 2,2,6,6-tetramethyl-3,5-heptanedionate (thd) with TMEDA (N,N,N',N'tetramethyl-1,2-diaminoethane) and aminoalcohols, namely 1-dimethylamino-2-propanol (DMAPH) and 2-dimethylaminoethanol (DMAEH), have been synthesized and characterized by elemental analyses, FT-IR, H-1 NMR, mass spectrometry and TGA. The molecular structures of Co(acaC)(2)(TMEDA) (1) and [Co(acaC)(2)(DMAPH)](2) (2) have been determined by single-crystal X-ray diffraction. 1 is monomeric while 2 is dimeric with two molecules linked by hydrogen bonds (O-H-O distance 2.708 Angstrom av.). The most volatile and stable new adducts Co(acaC)(2)(TMEDA) and Co(thd)(2)(TMEDA) have been studied as precursors for cobalt oxide deposition by liquid injection MOCVD in DME on monocrystalline LaAlO3 and Si substrates. Films were characterized by XRD and XPS. These preliminary MOCVD experiments showed that epitaxial Co3O4 films can be obtained by using both new precursors. (C) 2003 Elsevier Ltd. All rights reserved.
机译:2,4-戊二酸钴(acac)和2,2,6,6-四甲基-3,5-庚二酸钴(thd)与TMEDA(N,N,N',N'tetramethyl-1,2)的加合物-二氨基乙烷)和氨基醇,即1-二甲基氨基-2-丙醇(DMAPH)和2-二甲基氨基乙醇(DMAEH),已通过元素分析,FT-IR,H-1 NMR,质谱和TGA进行了表征。 Co(acaC)(2)(TMEDA)(1)和[Co(acaC)(2)(DMAPH)](2)(2)的分子结构已通过单晶X射线衍射确定。 1是单体,而2是带有两个通过氢键连接的分子的二聚体(O-H-O距离为2.708埃)。已经研究了最易挥发和最稳定的新加合物Co(acaC)(2)(TMEDA)和Co(thd)(2)(TMEDA)作为通过液相注入MOCVD在DME中单晶LaAlO3和Si衬底上沉积钴氧化物的前体。胶片用XRD和XPS表征。这些初步的MOCVD实验表明,通过使用两种新的前驱体都可以获得外延Co3O4薄膜。 (C)2003 Elsevier Ltd.保留所有权利。

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