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Effect of Thickness on Structural, Optical and Electrical Properties of In_2S_3 Thin Films Grown by Thermal Evaporation for Solar Cell Buffer Layer Applications

机译:厚度对太阳能电池缓冲层应用热蒸发法生长In_2S_3薄膜的结构,光学和电学性质的影响

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摘要

A study on effect of thickness on the structural, optical and electrical properties of indium sulfide (In_2S_3) thin films is undertaken in this paper. The films of thickness 45 nm, 68 nm and 121 nm were deposited on glass and ITO coated glass substrates employing thermal evaporation method at room temperature. These films were subjected to X-ray diffractometer (XRD), UV-Vis spectrophotometer and source meter for structural, optical and electrical analysis respectively. The XRD results show that the In_2S_3 thin films are amorphous in nature. The optical band gap of films is varied in the range 2.06-2.57 eV and found to be decreased with thickness. The absorption and extinction coefficients are calculated and observed to be decreased with thickness while refractive index is increased. The optical analysis reveals that the films of 68 nm may be used in solar cell applications as buffer layer due to their optical energy band gap of 2.26 eV which coincides well with the ideal band gap of In_2S_3 thin films. The electrical analysis shows that the current-voltage characteristics are linear in nature. The resistivity is observed to be decreased with thickness while conductivity is increased. The results are in agreement with the available literature.
机译:本文研究了厚度对硫化铟(In_2S_3)薄膜的结构,光学和电学性质的影响。在室温下使用热蒸发法将厚度为45 nm,68 nm和121 nm的膜沉积在玻璃和ITO涂覆的玻璃基板上。将这些膜分别用X射线衍射仪(XRD),UV-Vis分光光度计和源计进行结构,光学和电学分析。 XRD结果表明In_2S_3薄膜本质上是非晶态的。薄膜的光学带隙在2.06-2.57 eV的范围内变化,并且随着厚度的增加而减小。计算吸收系数和消光系数,观察到吸收系数和消光系数随厚度而减小,而折射率增加。光学分析表明,68 nm的薄膜由于其2.26 eV的光能带隙而与In_2S_3薄膜的理想带隙相吻合,因此可以用作太阳能电池应用的缓冲层。电气分析表明,电流-电压特性本质上是线性的。观察到电阻率随厚度降低而电导率增加。结果与现有文献一致。

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  • 来源
    《Materials Focus》 |2015年第3期|184-188|共5页
  • 作者单位

    Department of Physics, Mohanlal Sukhadia University, Udaipur 313001, India;

    Department of Physics, Mohanlal Sukhadia University, Udaipur 313001, India;

    Department of Physics, Mohanlal Sukhadia University, Udaipur 313001, India;

    Centre of Excellence for Energy and Environment Studies, Deenbandhu Chhotu Ram University of Science and Technology, Murthal, Sonepat 131039, India;

    Centre of Excellence for Energy and Environment Studies, Deenbandhu Chhotu Ram University of Science and Technology, Murthal, Sonepat 131039, India;

    Department of Physics, Mohanlal Sukhadia University, Udaipur 313001, India;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    In_2S_3 Thin Films; X-ray Diffractometer; Buffer Layer; Optical Band Gap; Electrical Properties;

    机译:In_2S_3薄膜;X射线衍射仪;缓冲层;光学带隙电学特性;

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