机译:直流磁控溅射斜靶在纳米Al_2O_3纳米通道衬底上生长的ZnO:Al网络膜的结构,电学和光致发光特性
Department of Physics, School of Mathematics and Physics, University of Science and Technology Beijing, 30 Xueyuanlu, Haidian District, Beijing 100083, China;
Department of Physics, School of Mathematics and Physics, University of Science and Technology Beijing, 30 Xueyuanlu, Haidian District, Beijing 100083, China;
Deportment of Physics, School of Science, Beijing Technology and Business University, 33 Fuchenglu, Haidian District, Beijing 100048, China;
State Key Laboratory for Advanced Metals and Materials, University of Science and Technology Beijing, 30 Xueyuanlu, Haidian District, Beijing 100083, China;
thin films; nanostructures; sputtering; electrical properties; luminescence;
机译:斜靶直流磁控溅射法在纳米Al_2O_3纳米通道衬底上生长的Fe网络膜的结构,电学和磁性
机译:斜靶直流磁控溅射在玻璃上生长的ZnO:Al膜的结构和物理性能
机译:单圆柱靶脉冲直流磁控溅射沉积功率对掺铝ZnO薄膜结构和电性能的影响
机译:使用ZnO / MgO / Al_2O_3靶通过射频磁控溅射制备的Al掺杂MgZnO薄膜的物理性质
机译:研究磁控溅射生产的氧化锌基薄膜的结构,电,光和磁性能。
机译:磁控溅射对CdTe薄膜微结构光学和电学性质的基靶距离调节
机译:RF磁控溅射生长的Cu掺杂ZnO薄膜的结构,光学和电性能:太阳能光催化的应用