Method for coating a substrate with a transparent metal oxide layer using magnetron sputtering comprises directing the plasma for the sputtering onto the sputtered target material in the coating region

摘要

Method for coating a substrate (5) with a transparent metal oxide layer using magnetron sputtering comprises directing the plasma for the sputtering onto the sputtered target material in the coating region. A layer for the screens (24) for the substrate is produced so that transport of the substrate is unimpeded and the passage of plasma and sputtered target material does not reach the space outside of the spatial expansion region of the plasma and the sputtered target material. Independent claims are also included for the following: (1) Coating chamber for coating substrates using magnetron sputtering; and (2) Coating installation containing the coating chamber.