机译:具有高k最后替代金属栅极技术的激进缩放平面和多栅极鳍式场效应晶体管器件的有效功函数工程
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
Assignee at IMEC from Panasonic, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
Assignee at IMEC from Applied Materials Belgium NV, Kapeldreef 75, B-3001 Leuven, Belgium;
Applied Materials Inc., 3050 Bowers Ave., Santa Clara, CA 95054, U.S.A.;
Applied Materials Inc., 3050 Bowers Ave., Santa Clara, CA 95054, U.S.A.;
Applied Materials Inc., 3050 Bowers Ave., Santa Clara, CA 95054, U.S.A.;
Applied Materials Inc., 3050 Bowers Ave., Santa Clara, CA 95054, U.S.A.;
Applied Materials Inc., 3050 Bowers Ave., Santa Clara, CA 95054, U.S.A.;
Applied Materials Inc., 3050 Bowers Ave., Santa Clara, CA 95054, U.S.A.;
Applied Materials Inc., 3050 Bowers Ave., Santa Clara, CA 95054, U.S.A.;
Applied Materials Inc., 3050 Bowers Ave., Santa Clara, CA 95054, U.S.A.;
Applied Materials Inc., 3050 Bowers Ave., Santa Clara, CA 95054, U.S.A.;
Applied Materials Inc., 3050 Bowers Ave., Santa Clara, CA 95054, U.S.A.;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
IMEC, Kapeldreef 75, B-3001 Leuven, Belgium;
机译:W与Co-Al作为栅极填充金属,用于(子)22 nm技术节点的大规模替代高k /金属栅极器件
机译:热处理和等离子处理,用于改进(小于)1 nm等效氧化物厚度的平面和基于FinFET的替代金属栅极高k后器件,并支持简化的可扩展CMOS集成方案
机译:双金属栅极技术,具有金属插入的全硅化物叠层和富镍的全硅化物栅电极,使用单个富镍的全硅化物相用于规模化的高k互补金属氧化物半导体场效应晶体管
机译:用于大规模缩放的平面和基于FinFET的器件的替代金属栅极/ High-k Last技术
机译:适用于未来规模化技术的高介电常数电介质和高迁移率半导体:氧化ha /锗CMOS器件的Ha基高K栅极电介质和界面工程
机译:高k金属门设备中的工作功能设置