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首页> 外文期刊>IEEE Transactions on Nuclear Science >Mechanism Analysis of Proton Irradiation-Induced Increase of 3-dB Bandwidth of GaN-Based Microlight-Emitting Diodes for Space Light Communication
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Mechanism Analysis of Proton Irradiation-Induced Increase of 3-dB Bandwidth of GaN-Based Microlight-Emitting Diodes for Space Light Communication

机译:质子辐射诱导的GaN基微宽度发射二极管3-DB带宽增加的机理分析,用于空间光通信

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摘要

Influences of 170-keV protons beam irradiation on the static and dynamic properties of blue light InGaN/GaN multiple quantum wells (MQWs) microlight-emitting diodes (Micro-LEDs) were investigated. It was interesting to find out that, although threshold voltage and light output power of Micro-LEDs deteriorated after proton irradiation, a 3-dB bandwidth was greatly improved. In quantitative terms, at the forward current density of 1 kA/cm2, 3-dB bandwidth increased from original 7.34 to 119.74 MHz when Micro-LED exposed to proton beam with the fluence of $5imes 10^{14}$ p/cm2. Based on the frequency response data analysis, differential carrier lifetimes of Micro-LEDs, including Shockley–Read–Hall (SRH) lifetime and differential radiation recombination lifetime, were compared. The results pointed out that both SRH and recombination lifetimes became shorter after proton irradiation, indicating that competition between the nonradiative and radiative recombination processes was enhanced by proton beam. To reveal the origination of the 3-dB bandwidth improvement, photoluminescence (PL) and time-resolved PL (TRPL) spectrums of Micro-LEDs were measured. MQWs’ PL spectrum with a peak wavelength of 450 nm was observed and its intensity decreased as proton fluence increasing. Meanwhile, a PL peak at 550 nm, which was well known as defect-related PL spectrum, was enhanced by proton irradiation, especially at a proton fluence of $5imes 10^{13}$ and $5imes 10^{14}$ p/cm2, proving the increase of defects in epitaxial thin films as proton fluence increasing. In the TRPL experimental study, the nonradiative recombination lifetime decreased with proton fluence, which was consistent with the results analyzed by frequency response. Overall, the improvement of 3-dB bandwidth could be mainly attributed to the decrease of carrier lifetime in MQWs, which were caused by the generation of defects due to the atom displacement effect of proton irradiation.
机译:研究了170-keV质子射线照射对蓝光Ingan / GaN多量子孔(MQWS)微光发射二极管(微LED)的静态和动态特性的影响。有趣的是,尽管在质子辐射后微LED的阈值电压和光输出功率劣化,但大大提高了3dB带宽。在定量术语,在前电流密度为1ka / cm 2 当微型LED暴露于质子束时,3 dB带宽从原始7.34到119.74 MHz增加<内联公式XMLNS:MML =“http://www.w3.org/1998/math/mathml”xmlns:xlink =“http://www.w3.org/1999/xlink”> $ 5 times 10 ^ {14} $ p / cm. 2 。基于频率响应数据分析,比较了微LED的差分载体寿命,包括震惊读音室(SRH)寿命和差分辐射重组寿命。结果指出,质子辐射后SRH和重组寿命均变短,表明通过质子束提高了非辐射和辐射重组过程之间的竞争。为了揭示3-DB带宽改进的起源,测量光致发光(PL)和时间分辨的PL(TRPL)的微LED频谱。观察到具有450nm的峰值波长的MQWS的PL光谱,并且由于质子流量增加,其强度降低。同时,通过质子辐射增强了550nm处的PL峰,其是缺陷相关的PL光谱,特别是在质子流量<内联公式XMLNS:MML =“http://www.w3.org/1998/math/mathml”xmlns:xlink =“http://www.w3.org/1999/xlink”> $ 5 times 10 ^ {13} $ 和<内联公式XMLNS:MML =“http://www.w3.org/1998/math/mathml”xmlns:xlink =“http://www.w3.org/1999/xlink”> $ 5 times 10 ^ {14} $ p / cm. 2 ,证明外延薄膜中的缺陷增加,因为质子流量增加。在TRPL实验研究中,非相互作用的重组寿命随着质子的流量降低,这与通过频率响应分析的结果一致。总体而言,3dB带宽的改善可能主要归因于MQW中的载体寿命的减少,这是由于质子辐射的原子位移效应导致的缺陷引起的。

著录项

  • 来源
    《IEEE Transactions on Nuclear Science》 |2020年第7期|1360-1364|共5页
  • 作者单位

    Key Laboratory of Silicon Device Technology Chinese Academy of Sciences Beijing China;

    Guangdong Institute of Semiconductor Industrial Technology Guangzhou China;

    Key Laboratory of Silicon Device Technology Chinese Academy of Sciences Beijing China;

    Guangdong Institute of Semiconductor Industrial Technology Guangzhou China;

    Laboratory of Nanophotonic Functional Materials and Devices South China Normal University Guangzhou China;

    Department of Physics State Key Laboratory for Artificial Microstructure and Mesoscopic Physics Peking University Beijing China;

    Guangdong Institute of Semiconductor Industrial Technology Guangzhou China;

    Department of Physics State Key Laboratory for Artificial Microstructure and Mesoscopic Physics Peking University Beijing China;

    Key Laboratory of Silicon Device Technology Chinese Academy of Sciences Beijing China;

    Key Laboratory of Silicon Device Technology Chinese Academy of Sciences Beijing China;

    Guangdong Institute of Semiconductor Industrial Technology Guangzhou China;

    Laboratory of Nanophotonic Functional Materials and Devices South China Normal University Guangzhou China;

    Key Laboratory of Silicon Device Technology Chinese Academy of Sciences Beijing China;

    Chinese Academy of Sciences Institute of Semiconductors Beijing China;

    Key Laboratory of Silicon Device Technology Chinese Academy of Sciences Beijing China;

    Key Laboratory of Silicon Device Technology Chinese Academy of Sciences Beijing China;

    Key Laboratory of Silicon Device Technology Chinese Academy of Sciences Beijing China;

    Key Laboratory of Silicon Device Technology Chinese Academy of Sciences Beijing China;

    School of Materials Science and Engineering Harbin Institute of Technology Harbin China;

    School of Materials Science and Engineering Harbin Institute of Technology Harbin China;

    Key Laboratory of Silicon Device Technology Chinese Academy of Sciences Beijing China;

    Key Laboratory of Silicon Device Technology Chinese Academy of Sciences Beijing China;

    Key Laboratory of Silicon Device Technology Chinese Academy of Sciences Beijing China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Protons; Quantum well devices; Radiation effects; Bandwidth; Light emitting diodes; Radiative recombination; Power generation;

    机译:质子;量子阱器件;辐射效应;带宽;发光二极管;辐射重组;发电;

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