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2.0 μm wavelength InAs quantum dashes grown on a GaAs substrate using a metamorphic buffer layer

机译:使用变质缓冲层在GaAs衬底上生长的2.0μm波长InAs量子破折号

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摘要

We describe optical and structure characteristics of InAs quantum dashes grown on a GaAs substrate using an AlGaAsSb metamorphic buffer. The metamorphic buffer increases the lattice constant of the growth matrix from 5.653 to 5.869 A. The increased lattice constant of the growth matrix yields a lattice mismatch with the InAs active region of only 3.2% and accommodates a large In content to access emission wavelengths >2.0 μm. From our comparison with quantum dot structures, we conclude that the elongated quantum dash formation is due to asymmetric surface bonds in the zinc blende crystal structure that control surface migration in low strain conditions.
机译:我们描述了使用AlGaAsSb变质缓冲区在GaAs衬底上生长的InAs量子虚线的光学和结构特征。变质缓冲液将生长基质的晶格常数从5.653 A增加到5.869A。生长基质的晶格常数增加,与InAs活性区的晶格失配仅为3.2%,并容纳较大的In含量以访问发射波长> 2.0微米通过与量子点结构的比较,我们得出结论,延长的量子点形成是由于锌共混物晶体结构中的不对称表面键所致,该键在低应变条件下控制了表面迁移。

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