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Enhanced ferroelectric and piezoelectric properties in doped lead-free (Bi_(0.5)Na_(0.5))_(0.94)Ba_(0.06)TiO_3 thin films

机译:掺杂无铅(Bi_(0.5)Na_(0.5))_(0.94)Ba_(0.06)TiO_3薄膜中增强的铁电和压电性能

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摘要

Doping effects with respect to the electrical properties of morphotropic phase boundary (Bi_(0.5)Na_(0.5))_(0.94)Ba_(0.06)TiO_3 thin films epitaxially grown on CaRuO_3 electroded (LaAlO_3)_(0.3)(Sr_2AlTaO_6)_(0.35) (001) substrates were investigated. Substantial enhancement of ferroelectricity and piezoelectricity has been achieved in La+Ce codoped films with a remanent polarization P_r of 29.5 μC/cm~2 and a remanent piezoelectric coefficient d_(33f) of 31 pm/V, whereas Mn doping seems more favorite to reduce the leakage current by two order of magnitude. Both doped films exhibited diodelike Ⅰ-Ⅴ characteristics, which are correlated with resistance switching effect.
机译:掺杂对同质相界(Bi_(0.5)Na_(0.5))_(0.94)Ba_(0.06)TiO_3薄膜的电学特性的影响,外延生长在电极上(LaAlO_3)_(0.3)(Sr_2AlTaO_6)_( 0.35)(001)基板进行了研究。 La + Ce共掺杂膜的剩余极化P_r为29.5μC/ cm〜2,剩余压电系数d_(33f)为31 pm / V时,铁电性和压电性得到了显着提高,而Mn掺杂似乎更倾向于减少泄漏电流降低了两个数量级。两种掺杂膜均表现出类似二极管的Ⅰ-Ⅴ特性,这与电阻开关效应有关。

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  • 来源
    《Applied Physics Letters》 |2010年第21期|p.212901.1-212901.3|共3页
  • 作者单位

    School of Materials Science and Engineering, The University of New South Wales, Sydney, New South Wales 2052, Australia;

    Department of Applied Physics and Materials Research Centre, The Hong Kong Polytechnic University, Hung Horn, Kowloon, Hong Kong;

    School of Materials Science and Engineering, The University of New South Wales, Sydney, New South Wales 2052, Australia;

    Department of Applied Physics and Materials Research Centre, The Hong Kong Polytechnic University, Hung Horn, Kowloon, Hong Kong;

    Department of Imaging and Applied Physics, Curtin University of Technology, GPO Box U 1987, Perth, WA 6845, Australia;

    Department of Applied Physics and Materials Research Centre, The Hong Kong Polytechnic University, Hung Horn, Kowloon, Hong Kong;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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