机译:(100)氧插入硅通道中电子迁移率的提高
Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, California 94720, USA;
Mears Technologies, Inc., Wellesley Hills, Massachusetts 02481, USA;
Mears Technologies, Inc., Wellesley Hills, Massachusetts 02481, USA;
Mears Technologies, Inc., Wellesley Hills, Massachusetts 02481, USA;
Mears Technologies, Inc., Wellesley Hills, Massachusetts 02481, USA;
SK Hynix, Icheon-si, Gyeonggi-do 467-701, South Korea;
SK Hynix, Icheon-si, Gyeonggi-do 467-701, South Korea;
Mears Technologies, Inc., Wellesley Hills, Massachusetts 02481, USA;
Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, California 94720, USA;
机译:基于(100)硅晶片的n沟道晶体管中与沟道取向无关的电子迁移率物理及其实验验证
机译:100 nm In_(0.4)AlAs / In_(0.35)GaAs变质高电子迁移率晶体管与氮化硅层的远程等离子体增强化学气相沉积钝化效应
机译:改进分裂电容电压法提取(100)取向绝缘体上硅衬底上的硅栅-AII- [100]-和[110]-定向纳米线金属氧化物-半导体场效应晶体管中的电子迁移率
机译:具有高K /金属栅叠层的N沟道氧插入(OI)硅沟道MOSFET的实验研究
机译:氧化g(100)/硅(100)界面处增强的电子迁移率:起源和应用。
机译:三重热氧化和硅玻璃阳极键合制备和表征亚100/10 nm平面纳米流体通道
机译:[110]硅纳米线中空穴迁移率的显着增强 与电子和体硅相比