Plasma Imaging and Optimization of Energy Deposition during Femtosecond-laser Processing

摘要

The presentation will provide an overview of our work on plasma imaging techniques for assessing the interaction of fs-laser pulses with dielectrics. Either time-integrated or, time-resolved, these techniques can be used in experimental conditions similar to those used during fs-laser processing. Their use unveils a number of mechanisms that deteriorate the spatial distribution of energy deposition. These effects can be assessed and minimized leading to highly optimized laser written structures.