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DISCHARGE BASED EUV SOURCE FOR MASK INSPECTION - (PPT)

机译:基于放电的掩模检查的EUV源 - (PPT)

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摘要

Discharge sources are already in commercial use for metrology applications, high maturity achieved; high efficiency for the conversion of electrical energy into EUV light typical plasma geometry: several 100μm in diameter, several mm in length; optical system for the homogeneous illumination of 50μm field of view easy to implement.
机译:放电来源已经用于计量应用的商业用途,实现了高成熟度;高效率使电能转化为EUV光典型等离子体几何形状:直径为10μm,长度为几毫米;光学系统为均匀照明50μm视场易于实现。

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